Toronto, Canada

Anthony E Redpath

This inventor holds 2 USPTO granted patents. Top assignee: Ecoplastics Limited. Active years: 1986-1987.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1986-1987

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Anthony E Redpath

Introduction

Anthony E Redpath is a notable inventor based in Toronto, Canada. He has made significant contributions to the field of materials science, particularly in the development of advanced photoresist compositions. With a total of 2 patents to his name, Redpath's work has implications for the microelectronics industry.

Latest Patents

Redpath's latest patents focus on fluorene-containing compounds and negative photoresist compositions. These polymers form crosslinked networks that serve as effective negative photoresists, sensitive to ultraviolet wavelengths ranging from about 200 nm to 300 nm. When utilized in negative photoresist compositions, these fluorene compounds enable high resolution, resulting in increased information density in microcircuits manufactured with these materials.

Career Highlights

Throughout his career, Anthony E Redpath has been associated with Ecoplastics Limited, where he has applied his expertise in polymer chemistry to innovate in the field of photoresists. His work has been instrumental in advancing the capabilities of microfabrication technologies.

Collaborations

Redpath has collaborated with various professionals in his field, including his coworker James E Guillet. These collaborations have fostered a productive environment for innovation and development.

Conclusion

Anthony E Redpath's contributions to the field of materials science, particularly through his patents on fluorene-containing compounds, highlight his role as a key innovator in the microelectronics industry. His work continues to influence advancements in technology and manufacturing processes.

Profile summary based on public USPTO records.
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