Hattem, Netherlands

Anthonie J Plak

This inventor holds 1 USPTO granted patent. Top assignee: Stamicarbon B.v.. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anthonie J Plak. Retrieved from https://idiyas.com/inventor/anthonie-j-plak

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Anthonie J Plak: Innovator in Coating Compositions

Introduction

Anthonie J Plak is a notable inventor based in Hattem, Netherlands. He has made significant contributions to the field of coating compositions, particularly through his innovative patent. His work reflects a commitment to advancing materials science and engineering.

Latest Patents

Anthonie J Plak holds a patent for a resin composition based on a polyester resin, an amino resin, and an epoxy resin. This invention relates to a coating composition that utilizes a carboxyl-functional polyester with a molecular weight ranging between 12,000 and 25,000. This innovative approach enhances the performance and application of coatings in various industries.

Career Highlights

Anthonie is associated with Stamicarbon B.V., a company known for its expertise in the field of chemical engineering and innovation. His role at Stamicarbon has allowed him to contribute to the development of advanced materials and coatings.

Collaborations

Anthonie has worked alongside talented colleagues such as Gerard Hardeman and Wilhelmina Westerhof. Their collaborative efforts have fostered an environment of innovation and creativity within their projects.

Conclusion

Anthonie J Plak's contributions to the field of coating compositions exemplify the impact of innovative thinking in materials science. His patent and collaborative work continue to influence advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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