Annie Tissier

Title: The Innovative Contributions of Annie Tissier

Introduction

Annie Tissier, a distinguished inventor based in Saint Ismier, France, has made significant advancements in the field of photolithography, crucial for integrated circuit manufacturing. With a total of four patents to her name, her work stands out for its innovative approaches to improving manufacturing processes in telecommunications and space technology.

Latest Patents

Annie Tissier’s latest patents include a "Process for adjusting a photolithographic exposure machine" and "A process and device for adjusting a photolithographic exposure machine". These inventions focus on refining the precision of photolithographic methods by utilizing a guide wafer equipped with identical test patterns. These patterns are illuminated by a white light beam, and the coefficient of reflectivity of each is measured. Tissier's invention establishes a law of correspondence relating reflectivity to a defocusing parameter, ultimately determining the optimum sharp focus value based on the reflectivity threshold.

Additionally, she developed a "Method for determining the complete elimination of a thin layer on a substrate." This process involves placing an optical diffraction grating on the substrate area, which is coated with a thin layer. Tissier's innovative method monitors the evolution of diffracted light during the etching process to ascertain the moment when the thin layer is entirely removed, showcasing her ability to integrate optical technologies into manufacturing processes.

Career Highlights

Throughout her career, Annie Tissier has collaborated with notable organizations such as France Telecom and the French State, specifically within the Ministry of Post, Telecommunications and Space. Her experience in these reputable institutions has enriched her knowledge and expertise in engineering and manufacturing technologies.

Collaborations

Annie has worked alongside esteemed coworkers Jean Galvier and Blandine Minghetti, both of whom have contributed to the advancement of technology in similar fields. These collaborations emphasize the importance of teamwork and collective innovation in achieving groundbreaking results.

Conclusion

Annie Tissier’s innovative inventions pave the way for improved processes in the challenging realm of integrated circuit manufacturing. Her contributions exemplify the impact that focused and determined inventors can have on advancing technology. With her established patents and extensive career background, Tissier remains a notable figure in the field of photolithography, inspiring future inventors to push the boundaries of innovation.