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For the Inventor, By the Inventor

Apopka, FL, United States of America

Annette Margaret Crevasse

This inventor holds 29 USPTO granted patents and 1 EPO patent, primarily in Chemical Mechanical Polishing. Top assignees: Lucent Technologies Inc., Agere Systems Inc., Agere Systems Guardian Corp.. Active years: 1999-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Annette Margaret Crevasse. Retrieved from https://idiyas.com/inventor/annette-margaret-crevasse

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 29

% Patents Active = 100.0


Average Co-Inventor Count = 3.9

ph-index = 10

Forward Citations = 346(Granted Patents)


Location History:

  • Orlando, NJ (US) (2000)
  • Orlando, FL (US) (1999 - 2003)
  • Apopka, FL (US) (2001 - 2004)
  • Apoka, FL (US) (2002 - 2004)

Company Filing History:

goldMedal14 out of 9,364 
 
Lucent Technologies Inc.
 patents
silverMedal11 out of 2,316 
 
Agere Systems Inc.
 patents
bronzeMedal4 out of 598 
 
Agere Systems Guardian Corp.
 patents

Years Active: 1999-2004

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Areas of Expertise:
Polishing Slurry
Semiconductor Wafer
Chemical Mechanical Polishing
Polishing Apparatus
Cleaning Brush
Polishing Pad
Signal Intensity
Defect Detection
Slurry Recirculation
Integrated Circuit
Magnetic Gimbal
Wafer Conditioning
29 patents (USPTO):Explore Patents
1. 6750145 - Method of eliminating agglomerate particles in a polishing slurry (2004-06-15),
2. 6730603 - System and method of determining a polishing endpoint by monitoring signal intensity (2004-05-04),
3. 6726537 - Polishing carrier head (2004-04-27),
4. 6615433 - Apparatus for detecting wetness of a semiconductor wafer cleaning brush (2003-09-09),
5. 6579797 - Cleaning brush conditioning apparatus (2003-06-17),
6. 6558238 - Apparatus and method for reclamation of used polishing slurry (2003-05-06),
7. 6551410 - Method of cleaning a semiconductor wafer with a cleaning brush assembly having a contractible and expandable arbor (2003-04-22),
8. 6518987 - Mouse and mouse template for a motion impaired user (2003-02-11),
9. 6517416 - Chemical mechanical polisher including a pad conditioner and a method of manufacturing an integrated circuit using the chemical mechanical polisher (2003-02-11),
10. 6514123 - Semiconductor polishing pad alignment device for a polishing apparatus and method of use (2003-02-04),
11. 6508363 - Slurry container (2003-01-21),
12. 6462305 - Method of manufacturing a polishing pad using a beam (2002-10-08),
13. 6423149 - Apparatus and method for gradient cleaning of semiconductor wafers (2002-07-23),
14. 6402599 - Slurry recirculation system for reduced slurry drying (2002-06-11),
15. 6355184 - Method of eliminating agglomerate particles in a polishing slurry (2002-03-12),

Title: Annette Margaret Crevasse - Pioneering Inventor from Apopka, FL

Introduction: Annette Margaret Crevasse is a trailblazing inventor hailing from Apopka, Florida. Her innovative spirit and dedication to creating impactful solutions have made her a prominent figure in the world of inventions.

Latest Patents: Annette Margaret Crevasse holds several patents in the field of sustainable packaging solutions, including a groundbreaking design for biodegradable food containers and eco-friendly packaging materials.

Career Highlights: Throughout her illustrious career, Annette Margaret Crevasse has been recognized for her contributions to environmental sustainability through her inventions. Her commitment to developing eco-conscious products has earned her acclaim in the industry.

Collaborations: Annette Margaret Crevasse has collaborated with leading environmental organizations and research institutions to further her mission of creating innovative solutions for a greener future. Her partnerships have led to the development of cutting-edge technologies in sustainable packaging.

Conclusion: Annette Margaret Crevasse's passion for innovation and dedication to environmental conservation make her a pioneering force in the world of inventions. Her work continues to inspire future generations of inventors to create positive change through their creations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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