Company Filing History:
Years Active: 2024
Title: Annette M Crevasse: Innovator in Chemical Mechanical Polishing Pads
Introduction
Annette M Crevasse is a notable inventor based in Elkton, MD (US). She has made significant contributions to the field of chemical mechanical polishing (CMP) through her innovative work. Her expertise and dedication have led to the development of advanced materials that enhance the performance of CMP pads.
Latest Patents
Annette holds a patent for "Formulations for high porosity chemical mechanical polishing pads with high hardness and CMP pads made therewith." This invention provides CMP polishing pads or layers with a Shore DO (15 second) hardness ranging from 40 to 80. The pads are created from a two-component reaction mixture that includes a liquid aromatic isocyanate component and a liquid polyol component. The formulation aims to reduce the density of the CMP polishing pad while maintaining its effectiveness.
Career Highlights
Annette is currently associated with Rohm and Haas Electronic Materials CMP Holdings, Inc. Her work at this company has been instrumental in advancing CMP technology. She has demonstrated a strong commitment to innovation and quality in her field.
Collaborations
Throughout her career, Annette has collaborated with talented individuals such as Bryan E Barton and Teresa Brugarolas Brufau. These partnerships have contributed to her success and the development of cutting-edge technologies in CMP.
Conclusion
Annette M Crevasse is a pioneering inventor whose work in chemical mechanical polishing pads has made a significant impact in the industry. Her innovative formulations and dedication to her craft continue to drive advancements in CMP technology.