Anneli Munkholm

Title: Innovations by Anneli Munkholm in Waveguide Applications

Introduction

Anneli Munkholm is an accomplished inventor based in Wailea, HI (US). She has made significant contributions to the field of optical devices, particularly in waveguide applications. Her innovative work has led to the development of techniques that enhance the performance of multi-layer optical devices.

Latest Patents

Anneli Munkholm holds a patent titled "Methods for correcting substrate thickness variation for waveguide applications." This patent discloses techniques for waveguide displays. The method involves measuring thickness variations within a target area of a first substrate to fabricate a first optical element. Based on these measurements, a thickness correction map is created to indicate the amounts of material to be removed in different regions. This process ensures that the target area is planarized effectively. The first substrate is then bonded to a second substrate, which contains a second optical element, to form a multi-layer structure. The method concludes with the singulation of the multi-layer structure from the layer stack.

Career Highlights

Anneli Munkholm is currently employed at Meta Platforms Technologies, LLC, where she continues to innovate in the field of optical technology. Her work is characterized by a commitment to advancing the capabilities of waveguide displays and optical devices.

Collaborations

Anneli has collaborated with notable colleagues, including Richard Farrell and Siddharth Buddhiraju. These partnerships have contributed to her success and the advancement of her projects.

Conclusion

Anneli Munkholm's contributions to waveguide applications exemplify her innovative spirit and dedication to advancing optical technology. Her patent and work at Meta Platforms Technologies, LLC highlight her role as a leading inventor in her field.