Anne Sakdinawat

Title: The Innovative Contributions of Anne Sakdinawat

Introduction

Anne Sakdinawat is a prominent inventor based in Coppell, TX (US). She has made significant contributions to the field of x-ray lithography and metrology. Her innovative work has led to the development of a unique mask apparatus that enhances the efficiency and effectiveness of x-ray applications.

Latest Patents

Anne holds a patent for a "Mask for X-ray lithography and metrology." This invention features a mask apparatus where the x-ray absorber material is embedded in diamond and covered with a thermally conductive material. This design provides the necessary thermal conductivity when irradiated with x-rays. The apparatus includes a hollow holder that is thermally interfaced with the mask and may also feature means for external thermal control. This mask allows for the transmission of x-rays from a lithography beam as well as metrology beams of other wavelengths, including UV, IR, and visible light. Anne has 1 patent to her name.

Career Highlights

Anne Sakdinawat has established herself as a key figure in her field through her innovative work at Exaktis Corporation. Her expertise in x-ray technology has positioned her as a valuable asset to the company.

Collaborations

Anne collaborates with her coworker, Yanwei Liu, to further advance their research and development efforts in x-ray lithography and metrology.

Conclusion

Anne Sakdinawat's contributions to the field of x-ray lithography and metrology exemplify her innovative spirit and dedication to advancing technology. Her work continues to influence the industry and pave the way for future advancements.