Anne M Lackner

Title: The Innovative Contributions of Anne M. Lackner

Introduction

Anne M. Lackner is a notable inventor based in Los Angeles, California. She has made significant contributions to the field of semiconductor technology. Her innovative methods have paved the way for advancements in the polishing of cadmium sulfide semiconductors.

Latest Patents

Anne M. Lackner holds a patent for a method specifically designed for polishing cadmium sulfide semiconductors. This method involves polishing a substrate with a pad charged with Transene and Cab-O-Sil while adding an iodine solution in small quantities. The final polishing phase is conducted while flushing the polishing pad with Transene. Upon completion, the substrate undergoes an immediate wash with Transene, followed by ultrasonic cleaning in Transene. After this cleaning process, the substrate is rinsed again in Transene and then spun dried. This continuous cleaning process ensures that the cleaning solutions remain in active contact with the substrate, resulting in a haze-free product. She has 1 patent to her name.

Career Highlights

Anne M. Lackner is currently represented by the Secretary of the Navy in the USA. Her work has been instrumental in enhancing the quality and efficiency of semiconductor polishing techniques.

Collaborations

One of her notable collaborators is Phillip G. Reif, with whom she has worked closely on various projects related to semiconductor technology.

Conclusion

Anne M. Lackner's innovative methods in semiconductor polishing demonstrate her significant impact on the field. Her contributions continue to influence advancements in technology and semiconductor manufacturing.