This inventor holds 2 USPTO granted patents. Top assignee: Other. Active years: 2002-2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Sunnyvale, CA (US) (2002)
- San Jose, CA (US) (2003)
Company Filing History:
Years Active: 2002-2003
Title: The Innovative Contributions of Anna Lena Thilderkvist
Introduction
Anna Lena Thilderkvist is a notable inventor based in San Jose, California. She has made significant contributions to the field of silicon surface finishing, holding 2 patents that showcase her innovative approach to technology. Her work focuses on improving the quality and efficiency of silicon surfaces, which are critical in various applications, particularly in the semiconductor industry.
Latest Patents
Thilderkvist's latest patents include an "Apparatus and method for surface finishing a silicon film." This invention describes a method for smoothing a silicon surface formed on a substrate. The process involves placing a substrate with a silicon surface into a chamber and heating it to a temperature between 1000°-1300° C. While the substrate is heated, the silicon surface is exposed to a gas mix comprising hydrogen and hydrochloric acid in the chamber, effectively smoothing the silicon surface.
Career Highlights
Throughout her career, Anna Lena Thilderkvist has demonstrated a commitment to advancing technology in her field. Her innovative methods have the potential to enhance the performance of silicon-based devices, making her a valuable contributor to the industry.
Collaborations
Thilderkvist has worked alongside talented individuals such as Paul B Comita and Lance A Scudder. These collaborations have likely enriched her work and contributed to her success as an inventor.
Conclusion
Anna Lena Thilderkvist's contributions to silicon surface finishing highlight her innovative spirit and dedication to technological advancement. Her patents reflect her expertise and commitment to improving the quality of silicon surfaces, making her a significant figure in her field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile