Aci Castello, Italy

Anna Battaglia


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 36(Granted Patents)


Company Filing History:


Years Active: 2011

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Anna Battaglia and Her Advancements in Thin Film Technology

Introduction: Anna Battaglia, an accomplished inventor based in Aci Castello, Italy, has made a significant mark in the field of material science. With a focus on resistive thin films, her work has garnered attention not only for its technical innovation but also for its practical applications in various industries.

Latest Patents: Anna holds a patent for her invention titled "Ternary Tungsten-Containing Resistive Thin Films." This patent discusses heater elements made of high resistivity ternary and quaternary thin films containing elements such as tungsten, carbon, oxygen, nitrogen, and silicon. The thin films are noted for their resistivities of approximately 1000 μΩ-cm at 50 to 60 Angstroms and provide improved stability over traditional binary films upon annealing. The patent also describes methods for depositing these thin films from an organometallic tungsten precursor under optimal conditions to achieve a highly resistive, continuous film.

Career Highlights: Anna is currently working at Novellus Systems Incorporated, a company renowned for its innovations in semiconductor processing. Her work in developing high-performance materials has the potential to impact diverse applications ranging from electronics to energy solutions.

Collaborations: Throughout her career, Anna has had the privilege of collaborating with notable colleagues such as Kaihan Abidi Ashtiani and Raashina Humayun. Their combined expertise strengthens their projects and enhances the quality of their research outcomes.

Conclusion: Anna Battaglia exemplifies the spirit of innovation through her dedication to advancing material technology. With her patent and ongoing contributions at Novellus Systems Incorporated, she continues to pave the way for future developments in resistive thin films. Her collaborative efforts underline the importance of teamwork in achieving groundbreaking results in the field of science and engineering.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…