Ann Chien

Title: Ann Chien: Innovator in Semiconductor Processing

Introduction

Ann Chien is a prominent inventor based in Taipei, Taiwan. She has made significant contributions to the field of semiconductor processing, particularly through her innovative patent related to aluminum etching techniques. Her work is essential in advancing the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

Ann Chien holds a patent for a method of processing substrates. This invention pertains to a method of oxide hardmask aluminum etching in metal dry etch processors. The process consists of two main steps: first, dry etching an aluminum interconnect stack using an etch gas primarily composed of boron trichloride, chlorine, fluoroform, and nitrogen. The second step involves removing etch remnants with vapor plasma. The etch gas is designed to etch the aluminum interconnection pattern in semiconductors, while the water vapor plasma prevents chip corrosion during the removal of etch remnants. This innovative approach reduces the need for extensive water rinsing and solution cleaning, which is common in conventional practices.

Career Highlights

Ann Chien is currently employed at Lam Research Corporation, where she continues to develop cutting-edge technologies in semiconductor processing. Her expertise and innovative mindset have positioned her as a valuable asset in her field.

Collaborations

Some of her notable coworkers include Sterling M. Goyer and Brett C. Richardson, who contribute to the collaborative environment at Lam Research Corporation.

Conclusion

Ann Chien's contributions to semiconductor processing through her innovative patent demonstrate her commitment to advancing technology in this critical industry. Her work not only enhances manufacturing processes but also sets a foundation for future innovations in semiconductor technology.