Kessel-lo, Belgium

Anja Vanleenhove


Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 33(Granted Patents)


Company Filing History:


Years Active: 2012

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2 patents (USPTO):Explore Patents

Title: Anja Vanleenhove: Innovator in Photolithography

Introduction

Anja Vanleenhove is a prominent inventor based in Kessel-lo, Belgium. She has made significant contributions to the field of photolithography, holding 2 patents that showcase her innovative approach to enhancing lithographic processes. Her work is pivotal in advancing technology in semiconductor manufacturing.

Latest Patents

Anja's latest patents include a method of photolithography that involves several critical steps. The process begins with providing a substrate and forming a layer of photoresist on it. A first exposure is performed, where a predetermined part of the photoresist layer is irradiated through a mask, creating a latent image. Following this, a pretreatment is applied to remove part of the latent image before fixation, resulting in an improved process window. Additionally, she has developed a method for double patterning in lithography, which increases feature spatial density. This method allows for the formation of interspersed features with a spatial frequency greater than that of individual patterns, particularly benefiting the definition of source, drain, and fin features in finFET devices.

Career Highlights

Anja Vanleenhove is currently employed at NXP B.V., where she continues to push the boundaries of innovation in her field. Her expertise in photolithography has positioned her as a key player in the semiconductor industry, contributing to advancements that enhance device performance and manufacturing efficiency.

Collaborations

Throughout her career, Anja has collaborated with notable colleagues, including David Van Steenwinckel and Peter Dirksen. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and innovation.

Conclusion

Anja Vanleenhove's contributions to photolithography exemplify her commitment to innovation and excellence in the semiconductor industry. Her patents reflect a deep understanding of the complexities involved in lithographic processes, making her a valuable asset to her company and the field at large.

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