The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2012
Filed:
Jul. 31, 2007
Hans Kwinten, Luyksgestel, NL;
Peter Zandbergen, Hechtel-Eksel, BE;
David Van Steenwinckel, Holsbeek, BE;
Anja Vanleenhove, Kessel-Lo, BE;
Hans Kwinten, Luyksgestel, NL;
Peter Zandbergen, Hechtel-Eksel, BE;
David Van Steenwinckel, Holsbeek, BE;
Anja Vanleenhove, Kessel-Lo, BE;
NXP B.V., Eindhoven, NL;
Abstract
The invention relates to a method of photolithography comprising the steps of: providing a substrate and forming a layer of a photoresist on the substrate, performing a first exposure in which a predetermined part of the layer of photoresist is irradiated through a mask having a pattern for forming a latent image of said pattern in the layer of the photoresist, performing a pretreatment on the layer of the photoresist to remove a predetermined part of the latent image before performing the fixation. The method provides an improved process window. The invention further relates to a photoresist for use within the method of the invention.