San Jose, CA, United States of America

Anish Tolia


Average Co-Inventor Count = 3.9

ph-index = 8

Forward Citations = 480(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2001)
  • San Jose, CA (US) (2000 - 2005)

Company Filing History:


Years Active: 2000-2005

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10 patents (USPTO):

Title: Innovator Spotlight: Anish Tolia - Revolutionizing Copper Deposition Techniques

Introduction: Anish Tolia, a brilliant inventor based in San Jose, CA, has made significant strides in the field of copper deposition processes. With an impressive portfolio of 10 patents, his groundbreaking work at Applied Materials, Inc., has reshaped the way copper seed layers are deposited in vias.

Latest Patents: Anish Tolia's latest patents focus on a multi-step process for depositing copper seed layers in a via using a DC magnetron sputter reactor. The method harnesses self-ionized plasma (SIP) sputtering at low pressures to coat copper into narrow and deep vias. By utilizing SIP and innovative sputtering techniques, Tolia's inventions pave the way for efficient and precise hole filling in high aspect-ratio structures.

Career Highlights: Anish Tolia's tenure at Applied Materials, Inc., has been marked by a series of groundbreaking inventions in the realm of semiconductor manufacturing. His expertise in optimizing copper deposition processes has garnered recognition within the industry, positioning him as a leading figure in advanced materials engineering.

Collaborations: Tolia has collaborated closely with esteemed colleagues such as Tushar Mandrekar and Tony P. Chiang. Together, they have synergized their knowledge and expertise to push the boundaries of copper deposition technologies, setting new standards for precision and efficiency in semiconductor fabrication.

Conclusion: Anish Tolia's innovative contributions to the field of copper deposition techniques underscore his relentless pursuit of excellence in semiconductor manufacturing. His inventive spirit, coupled with his dedication to advancing technological frontiers, continues to inspire meaningful progress in the industry.

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