Pune, India

Aniruddha Katkar

This inventor holds 1 USPTO granted patent. Top assignee: Siemens Industry Software Nv. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Aniruddha Katkar. Retrieved from https://idiyas.com/inventor/aniruddha-katkar

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Aniruddha Katkar and His Patent in Collaborative Simulation

Introduction

Aniruddha Katkar is an inventor based in Pune, India, associated with Siemens Industry Software NV. His patent work focuses on enabling geometric components to be analyzed across collaborative simulation environments.

Latest Patents

Katkar is credited with 1 patent: “Method and System for Performing Seamless Analysis of Geometric Components in Multi-Domain Collaborative Simulation Environments.” The invention describes generating a simulation interface object for a geometric component in one simulation environment, with its associated loads and boundary conditions. A second environment, representing a different domain, can access those conditions through the interface object and use them to analyze the component. The analysis results are then displayed in the second environment’s graphical user interface.

Career Highlights

Katkar’s patent reflects work on connecting distinct simulation domains and making it possible to transfer relevant component conditions between them. This approach supports analysis across environments without requiring the load and boundary conditions to be recreated manually.

Collaborations

The provided information lists Amit Nargund and Kshitiz Johri as Katkar’s coworkers. Their specific roles in the patent or related work are not stated.

Conclusion

Aniruddha Katkar’s patented method addresses cross-domain collaboration in engineering simulation by linking component conditions with analysis and results in a separate environment.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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