This inventor holds 2 USPTO granted patents. Top assignee: Hewlett-Packard Company. Active years: 1993-1995.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1993-1995
Title: Anil P Noronha: Innovator in High Pressure Seal Technology
Introduction
Anil P Noronha is a notable inventor based in West Chester, PA (US). He has made significant contributions to the field of pressure sealing technology, holding 2 patents that showcase his innovative approach to solving complex engineering challenges.
Latest Patents
Noronha's latest patents focus on methods and apparatus for forming an integral high pressure seal. One of his key inventions involves a cap designed for sealing pressure vessels. This invention allows for a nominal closure to be achieved through hand tightening, while a separate clamp mechanism can apply a substantially higher force to create a secure pressure seal. The cap assembly also includes features for process flow and filtering, making it particularly useful for sealing sample vessels used in supercritical fluid extraction. This technology enables the automation and monitoring of sample placement in pressurized systems, ensuring that adequate seals are maintained.
Career Highlights
Anil P Noronha is currently associated with Hewlett-Packard Company, where he continues to innovate and develop new technologies. His work has had a significant impact on the field of pressure sealing, enhancing the efficiency and reliability of various applications.
Collaborations
Throughout his career, Noronha has collaborated with talented individuals such as Louis T Staats, III and James A Bristow. These collaborations have contributed to the advancement of his inventions and the successful implementation of his patented technologies.
Conclusion
Anil P Noronha's contributions to high pressure seal technology exemplify the spirit of innovation. His patents not only address critical engineering needs but also pave the way for future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
