Munich, Germany

Anil Kirmaz

This inventor holds 1 USPTO granted patent and 4 published patent applications and 1 EPO patent. Top assignee: Nokia Technologies Oy. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anil Kirmaz. Retrieved from https://idiyas.com/inventor/anil-kirmaz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Anil Kirmaz - Innovator in Positioning Technologies

Introduction: Anil Kirmaz is an inventor based in Munich, Germany, who is currently associated with Nokia Technologies Oy. He is known for his contributions to the field of positioning technologies, focusing on methods that enhance accuracy in various applications. Although he has not yet been granted any patents, his work is significant in advancing the technology landscape.

Latest Patent Applications: Anil Kirmaz has filed several patent applications that showcase his innovative ideas. One of his latest applications is titled "Weighting Positioning Measurements." This application proposes a method for weighting positioning measurements by determining a difference between a measurement and a reference value based on channel features. The method aims to improve positioning accuracy without requiring multiple measurements for weight assignment. Another notable application is "Bandwidth Based and/or Scenario Based Feature Selection for High Line-of-Sight/Non-Line-of-Sight Classification Accuracy." This application describes a method for classifying channel measurements to estimate the likelihood of different propagation conditions, which is crucial for effective positioning.

Conclusion: Anil Kirmaz is a promising inventor whose work in positioning technologies has the potential to impact various industries. His innovative approaches in his latest patent applications reflect his commitment to enhancing measurement accuracy and classification methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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