Angli Bai

Title: The Innovative Contributions of Angli Bai

Introduction

Angli Bai is a notable inventor based in Shanghai, China. He has made significant contributions to the field of exposure apparatus technology. His innovative approach has led to the development of a unique exposure apparatus that enhances the efficiency of wafer exposure processes.

Latest Patents

Angli Bai holds a patent for an exposure apparatus and method. This apparatus includes an exposure unit designed for exposing a wafer, which features an illumination system and masks. The illumination system incorporates a light-homogenizing unit, which consists of a light-homogenizing quartz rod with a regular hexagonal cross-section. Each mask is shaped to match this hexagonal cross-section, resulting in a field of exposure that is less affected by objective field of view distortion. This design allows for a higher useful depth of focus (UDoF) compared to other exposure fields of the same size. Furthermore, with the same projection objective depth of focus, a greater field of exposure can be achieved.

Career Highlights

Angli Bai has worked with prominent companies in the microelectronics sector, including Shanghai Micro Electronics Equipment (Group) Co., Ltd. and Shanghai Micro Electronics Equipment Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced exposure technologies.

Collaborations

Angli Bai has collaborated with notable professionals in his field, including Renbiao Xie and Zhiyong Yang. These collaborations have further enriched his work and innovation in exposure apparatus technology.

Conclusion

Angli Bai's contributions to the field of exposure apparatus technology demonstrate his innovative spirit and commitment to advancing microelectronics. His patent reflects a significant step forward in improving wafer exposure processes, showcasing his role as a key inventor in this domain.