Cerritos, CA, United States of America

Ang-Ling Chu

This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignee: Nanogram Corporation. Active years: 2012-2014.


% Patents Active = 33.3

 

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2012-2014

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3 patents (USPTO):Explore Patents

Title: Innovations by Ang-Ling Chu

Introduction

Ang-Ling Chu is an accomplished inventor based in Cerritos, CA (US). He has made significant contributions to the field of materials science, particularly in the development of composites that incorporate polysiloxane polymers and inorganic nanoparticles. With a total of 3 patents to his name, his work has implications for various applications, including optical materials.

Latest Patents

Ang-Ling Chu's latest patents focus on the creation of desirable composites of polysiloxane polymers and inorganic nanoparticles. These composites can be formed based on the appropriate selection of the surface properties of the particles and the chemical properties of the polymer. High loadings of particles can be achieved with good dispersion throughout the polymer, resulting in composites that exhibit excellent optical properties. In some embodiments, the inorganic particles are substantially free of surface modification, enhancing their effectiveness in various applications.

Career Highlights

Ang-Ling Chu is currently associated with Nanogram Corporation, where he continues to innovate and develop new materials. His expertise in the field has led to advancements that benefit both the company and the broader scientific community.

Collaborations

Some of his notable coworkers include Hui Du and Shivkumar Chiruvolu. Their collaborative efforts contribute to the innovative environment at Nanogram Corporation.

Conclusion

Ang-Ling Chu's work exemplifies the spirit of innovation in materials science, particularly through his patents on polysiloxane polymer composites. His contributions are paving the way for future advancements in the field.

Profile summary based on public USPTO records.
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