Company Filing History:
Years Active: 2019
Title: Innovations of Andy Eichler in Vapor Generation Technology
Introduction
Andy Eichler is an accomplished inventor based in Aachen, Germany. He has made significant contributions to the field of vapor generation technology, holding a total of 2 patents. His work focuses on improving methods and devices used in chemical vapor deposition (CVD) and physical vapor deposition (PVD) processes.
Latest Patents
Eichler's latest patents include an "Apparatus and method for generating a vapor for a CVD or PVD device." This invention describes a device and method for vaporizing particles by bringing them into contact with a heat transfer surface. The generated vapor is then transported by a carrier gas into a modulation device, where specific temperatures are adjusted to control the condensation of vapor.
Another notable patent is the "Device and method for determining the concentration of a vapor by means of an oscillating body sensor." This invention provides a method for determining the concentration of vapor in a volume, particularly for controlling the mass flow of vapor conveyed through that volume. The device utilizes a sensor with an oscillatory body, which can be influenced by the mass accumulation of condensed vapor.
Career Highlights
Andy Eichler is currently employed at Aixtron SE, a company known for its advanced deposition equipment for the semiconductor industry. His work at Aixtron SE has allowed him to further develop his innovative ideas and contribute to the advancement of vapor generation technologies.
Collaborations
Eichler has collaborated with notable colleagues, including Michael Long and Birgit Irmgard Beccard, who is a prominent woman in the field. Their teamwork has fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.
Conclusion
Andy Eichler's contributions to vapor generation technology through his patents and work at Aixtron SE highlight his role as a significant inventor in the field. His innovative approaches continue to influence advancements in CVD and PVD processes, showcasing the importance of his work in the industry.