André Paul Labonté

Title: André Paul Labonté: Innovator in Sub-Micron Technology

Introduction

André Paul Labonté is a notable inventor based in Lewiston, ME (US). He has made significant contributions to the field of microfabrication, particularly with his innovative methods for creating sub-micron features. His work has implications for various applications in technology and manufacturing.

Latest Patents

Labonté holds a patent for a method of forming a sub-micron tip feature. This patent describes a single, controlled etch step that can be used to create a sharp tip feature along the sidewall of an etch feature. The etch process is selective to a layer of tip material relative to the substrate upon which the layer is deposited. By creating a lag in the etch, the etch rate is slower near the sidewall, allowing for the formation of a sharp tip feature from the same layer of material used to create the etch feature. This innovation can decrease the minimum critical dimension of an etch process, which is particularly beneficial in photolithographic applications. Additionally, the sharp tip feature can be utilized to create microapertures for photosensitive devices or micromolds for forming objects like microlenses.

Career Highlights

Labonté is currently employed at National Semiconductor Corporation, where he continues to push the boundaries of microfabrication technology. His work has been instrumental in advancing the capabilities of semiconductor manufacturing processes.

Collaborations

One of Labonté's notable collaborators is Lee James Jacobson. Their partnership has contributed to the development of innovative solutions in the field of microfabrication.

Conclusion

André Paul Labonté's contributions to the field of microfabrication through his patented methods for forming sub-micron features highlight his role as an innovator. His work at National Semiconductor Corporation continues to influence advancements in technology and manufacturing processes.