Dreieich, Germany

Andrzej Adamczyk

This inventor holds 1 USPTO granted patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andrzej Adamczyk. Retrieved from https://idiyas.com/inventor/andrzej-adamczyk-5e5cas65

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 1992

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Andrzej Adamczyk: Innovator in Dielectric Layer Production

Introduction

Andrzej Adamczyk is a notable inventor based in Dreieich, Germany. He has made significant contributions to the field of dielectric layers in planar circuits. His innovative approach has led to the development of a unique process that enhances the production of these essential components.

Latest Patents

Andrzej holds a patent for a process that involves the production of dielectric layers in planar circuits. The patent describes a method where apertures with inclined sidewalls are created in a dielectric layer. This is achieved by exposing a photoformable dielectric layer through a mask that lacks a sharp line of demarcation between opaque and transparent areas. This innovative technique has the potential to improve the efficiency and effectiveness of dielectric layer production.

Career Highlights

Andrzej Adamczyk is currently employed at E.I. du Pont de Nemours and Company, a leading organization in the field of materials science. His work at this esteemed company has allowed him to further develop his expertise and contribute to groundbreaking advancements in technology.

Collaborations

Andrzej has collaborated with William E. Delaney, a fellow innovator in the field. Their partnership has fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

Andrzej Adamczyk's contributions to the field of dielectric layer production exemplify the spirit of innovation. His patent and work at E.I. du Pont de Nemours and Company highlight his commitment to advancing technology. His collaborations further enhance the potential for future breakthroughs in this important area of research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…