Amsterdam, Netherlands

Andrianus Hendrick Hofman

This inventor holds 1 USPTO granted patent. Top assignee: Kraton Polymers U.S. LLC. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andrianus Hendrick Hofman. Retrieved from https://idiyas.com/inventor/andrianus-hendrick-hofman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2004

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Andrianus Hendrick Hofman: Innovator in Polymer Technology

Introduction

Andrianus Hendrick Hofman is a notable inventor based in Amsterdam, Netherlands. He has made significant contributions to the field of polymer technology, particularly in the area of hydrogenated polymers. His work has led to advancements that benefit various industries.

Latest Patents

Hofman holds a patent for a "Process for removing hydrogenation catalyst residue from hydrogenated polymers." This innovation addresses a critical challenge in polymer processing, ensuring higher quality and performance of the final products. He has 1 patent to his name, showcasing his expertise and commitment to innovation.

Career Highlights

Currently, Hofman is employed at Kraton Polymers U.S. LLC, a company known for its focus on advanced polymer solutions. His role at Kraton allows him to apply his knowledge and skills in a practical setting, contributing to the development of cutting-edge materials.

Collaborations

Hofman has worked alongside talented colleagues, including Heleen Johanna Augusta De Smet and Alan Villena. These collaborations have fostered a creative environment that encourages the exchange of ideas and enhances the innovation process.

Conclusion

Andrianus Hendrick Hofman is a distinguished inventor whose work in polymer technology has made a lasting impact. His patent and contributions to Kraton Polymers U.S. LLC highlight his dedication to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…