Location History:
- Wivelsfield Green, GB (1993 - 1999)
- Slinfold, GB (2004 - 2006)
- West Sussex, GB (2012)
Company Filing History:
Years Active: 1993-2012
Title: Innovations of Andrew S Devaney
Introduction
Andrew S Devaney is a notable inventor based in Wivelsfield Green, GB. He has made significant contributions to the field of ion implantation technology, holding a total of 7 patents. His work primarily focuses on advancements that enhance the efficiency and effectiveness of ion sources used in semiconductor manufacturing.
Latest Patents
Among his latest patents is a novel cathode and counter-cathode arrangement in an ion source. This invention relates to ion sources that are suitable for ion implanters, which are crucial in the production of semiconductor wafers. The ion source operates under vacuum conditions and generates ions using plasma created within an arc chamber. The design includes a cathode that emits electrons into the arc chamber, along with an electrode that can switch between acting as an anode and a counter-cathode, depending on the voltage potential applied.
Another significant patent is for a kinematic ion implanter electrode mounting. This invention features an electrode insert member that aligns with an electrode support frame using kinematic alignment pins. The design ensures precise alignment in both orthogonal directions and rotational orientation, enhancing the reliability of the ion implantation process.
Career Highlights
Andrew S Devaney is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to contribute to cutting-edge technologies that are essential for modern electronics manufacturing.
Collaborations
Throughout his career, Andrew has collaborated with notable colleagues, including Nicholas Bright and Paul A Burfield. These collaborations have fostered innovation and have been instrumental in the development of advanced technologies in the field.
Conclusion
Andrew S Devaney's contributions to ion implantation technology through his patents and work at Applied Materials, Inc. highlight his role as a significant inventor in the semiconductor industry. His innovations continue to impact the efficiency of semiconductor manufacturing processes.