Columbia, MO, United States of America

Andrew Ritts

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Nanova, Inc.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andrew Ritts. Retrieved from https://idiyas.com/inventor/andrew-ritts

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Andrew Ritts

Introduction

Andrew Ritts is a notable inventor based in Columbia, MO (US). He has made significant strides in the field of plasma technology. His work focuses on developing systems that utilize low-temperature plasma for various applications.

Latest Patents

Andrew Ritts holds a patent for a "Device for generating and delivering low temperature plasma." This innovative system includes a plurality of electrodes, featuring a grounded electrode and at least one high-voltage electrode. The design ensures that the tips of the grounded and high-voltage electrodes have a vertical-level difference, enhancing the efficiency of plasma generation.

Career Highlights

Ritts is currently associated with Nanova, Inc., where he applies his expertise in plasma technology. His contributions to the company have been instrumental in advancing their research and development efforts.

Collaborations

Andrew Ritts has collaborated with talented individuals such as Meng Chen and Zhengyu Ma. Their combined efforts have fostered innovation and progress within their projects.

Conclusion

Andrew Ritts exemplifies the spirit of innovation through his work in low-temperature plasma technology. His patent and contributions to Nanova, Inc. highlight his commitment to advancing scientific knowledge and practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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