Elbert, CO, United States of America

Andrew Mourn

This inventor holds 4 USPTO granted patents. Top assignees: Raytrx, LLC, Other. Active years: 2022-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andrew Mourn. Retrieved from https://idiyas.com/inventor/andrew-mourn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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4 patents (USPTO):Explore Patents

Title: The Innovative Journey of Andrew Mourn

Introduction

Andrew Mourn is a notable inventor based in Elbert, Colorado. He has made significant contributions to the field of wearable technology, holding a total of four patents. His work focuses on enhancing user experience through innovative display systems.

Latest Patents

One of Andrew's latest patents is the "Wearable Pupil-Forming Display Apparatus." This invention describes a wearable display apparatus that includes a headset, a left-eye optical system, a right-eye optical system, and an inter-pupil distance (IPD) adjustment system. This system is designed to adjust the inter-pupil spacing between the left-eye and right-eye optical systems, providing a more personalized viewing experience.

Career Highlights

Throughout his career, Andrew has worked with various companies, including Raytrx, LLC. His experience in the industry has allowed him to develop cutting-edge technologies that push the boundaries of wearable devices.

Collaborations

Andrew has collaborated with talented individuals such as Michael H. Freeman and Jordan Boss. These partnerships have contributed to the success of his innovative projects.

Conclusion

Andrew Mourn's work in the field of wearable technology exemplifies the spirit of innovation. His patents and collaborations highlight his commitment to advancing user experience through technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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