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For the Inventor, By the Inventor

Austin, TX, United States of America

Andrew M Ray

This inventor holds 8 USPTO granted patents. Top assignee: Eaton Corporation. Active years: 1987-1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andrew M Ray. Retrieved from https://idiyas.com/inventor/andrew-m-ray-rv7hpdsf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 100.0

Average Co-Inventor Count = 1.8

ph-index = 7

Forward Citations = 143(Granted Patents)


Company Filing History:

goldMedal8 out of 5,989 
 
Eaton Corporation
 patents

Years Active: 1987-1995

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8 patents (USPTO):Explore Patents
1. 5406088 - Scan and tilt apparatus for an ion implanter (1995-04-11),
2. 5229615 - End station for a parallel beam ion implanter (1993-07-20),
3. 5160846 - Method and apparatus for reducing tilt angle variations in an ion (1992-11-03),
4. 5091655 - Reduced path ion beam implanter (1992-02-25),
5. 4975586 - Ion implanter end station (1990-12-04),
6. 4943728 - Beam pattern control system for an ion implanter (1990-07-24),
7. 4929840 - Wafer rotation control for an ion implanter (1990-05-29),
8. 4700077 - Ion beam implanter control system (1987-10-13),

Title: The Innovative Mind of Andrew M. Ray

Introduction

Andrew M. Ray is a prominent inventor based in Austin, Texas, known for his significant contributions to the field of ion implantation technology. With a remarkable portfolio of eight patents, Ray continues to push the boundaries of innovation, particularly in the design and functionality of ion implanters.

Latest Patents

Among his latest inventions, Ray has developed a "Scan and Tilt Apparatus for an Ion Implanter," which features an advanced wafer-receiving platen assembly. This innovation allows for precise scanning motion of the wafer along a straight line, effectively intercepting the wafer tilt axis at any tilt position. Another groundbreaking patent is the "End Station for a Parallel Beam Ion Implanter." This invention consists of a sophisticated end station featuring a loading station, loadlock, vacuum chamber, and a wafer handler that is engineered to optimize the implantation process through versatile positioning and scanning capabilities.

Career Highlights

Ray’s career is marked by invaluable contributions to Eaton Corporation, where he works alongside a dynamic team of engineers and inventors. His expertise in ion implantation technology has not only enhanced the performance of existing systems but has also paved the way for future innovations in materials processing.

Collaborations

In his professional journey, Andrew M. Ray has collaborated with esteemed coworkers Jerald P. Dykstra and Robert A. Brune. Together, they have fostered an innovative environment at Eaton Corporation, contributing to advancements in ion implanter technology and furthering the field's growth.

Conclusion

Through his inventive spirit and dedication, Andrew M. Ray exemplifies what it means to be a modern inventor. His patents not only reflect technical ingenuity but also highlight the importance of collaboration in achieving groundbreaking advancements in technology. As he continues to innovate, the industry eagerly anticipates the impact of his future contributions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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