Somerville, MA, United States of America

Andrew Lushington

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovations of Andrew Lushington

Introduction

Andrew Lushington is an accomplished inventor based in Somerville, MA (US). He has made significant contributions to the field of vacuum technology, particularly in the design of systems used for deposition processes. His innovative approach has led to the development of a unique patent that addresses common challenges in the industry.

Latest Patents

Lushington holds a patent for a "Vacuum Gauge Protector for Deposition Systems." This invention features a body that includes an input port designed to connect to a vacuum chamber and an output port that connects to a vacuum gauge. A deposition material filter is strategically positioned within the body to create a tortuous path for gases containing deposition materials. The filter's surface area exceeds 2000 mm, effectively restricting deposition material from contaminating the vacuum gauge while ensuring sufficient gas flow. This design allows for a vacuum gauge response time of less than 10 seconds, enhancing the efficiency of deposition systems.

Career Highlights

Andrew Lushington is currently employed at Arradiance, Inc., where he continues to innovate and develop advanced technologies. His work has been instrumental in improving the reliability and performance of vacuum systems used in various applications. Lushington's expertise in this niche area has positioned him as a valuable asset to his company and the industry at large.

Collaborations

Lushington collaborates with talented professionals such as David R Beaulieu and Jeffrey D McHugh. Their combined efforts contribute to the advancement of technologies in the field of vacuum deposition.

Conclusion

Andrew Lushington's contributions to vacuum technology through his innovative patent demonstrate his commitment to enhancing deposition systems. His work not only addresses critical industry challenges but also paves the way for future advancements in the field.

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