Company Filing History:
Years Active: 2014-2017
Certainly! Here is the article about inventor Andrew Liu:
Title: Andrew Liu: Pioneering Precision in Extreme Ultraviolet Dosing
Introduction:
Andrew Liu, a visionary inventor based in San Diego, CA, is a trailblazer in the field of extreme ultraviolet (EUV) radiation control. With a remarkable portfolio of three patents, Liu has revolutionized dose control mechanisms in laser-produced plasma (LPP) EUV light sources. His innovative methods have set new standards for precision and uniformity in EUV energy generation.
Latest Patents:
1. EUV LPP source with improved dose control by combining pulse modulation and pulse control mode: In this patent, Liu introduces a method and apparatus that seamlessly integrate pulse modulation and pulse control mode to enhance the control of accumulated EUV dose. By measuring and adjusting the EUV energy created by each pulse, Liu's invention ensures superior dose accuracy and energy uniformity over time.
2. Method of timing laser beam pulses to regulate extreme ultraviolet light dosing: Liu's second patent focuses on manipulating pulse timing to achieve a constant desired dose target in laser-produced plasma EUV light systems. By adjusting the timing of laser beam pulses during stroboscopic firing or continuous burst mode, this method optimizes EUV dosing precision to meet downstream requirements effectively.
Career Highlights:
Andrew Liu is currently a key contributor at ASML Netherlands B.V., a renowned industry leader in semiconductor manufacturing technology. Through his groundbreaking research and innovative patents, Liu has solidified his reputation as a pioneer in advancing EUV dose control mechanisms.
Collaborations:
Collaborating closely with accomplished professionals like Matthew Graham and James H. Crouch, Liu has fostered a culture of innovation and excellence in his research endeavors. Together, they have synergistically contributed to cutting-edge developments in EUV technology.
Conclusion:
In conclusion, Andrew Liu's inventive prowess and dedication to precision in EUV dosing have reshaped the landscape of laser-produced plasma EUV light sources. His patents stand as a testament to his ingenuity and commitment to driving technological advancements that propel the industry forward. Liu's contributions continue to inspire and pave the way for future innovations in the field of EUV radiation control.