Company Filing History:
Years Active: 2001
Title: The Innovations of Andrew Lin: A Focus on Insulating Technologies
Introduction: Andrew Lin, an inventive mind hailing from Miao-Li Hsien, Taiwan, has made a significant contribution to the field of semiconductor technology. With a patent to his name, Lin has demonstrated a tangible ability to solve complex engineering challenges, particularly in the realm of insulating films.
Latest Patents: Lin's noteworthy patent, titled "Method for forming an insulating film," addresses the critical issue of non-uniform thickness in insulating layers. This innovative method involves the formation of a first insulating layer over a substrate using chemical vapor deposition (CVD) at temperatures ranging from 200°C to 350°C. The first layer's thickness varies between 500 Å and 5000 Å. Subsequently, a second insulating layer is deposited over the first, employing CVD techniques at elevated temperatures of 350°C to 500°C, with a thickness between 1000 Å and 10000 Å. Together, these layers effectively insulate transistors and isolation structures from the interconnect metal layer, showcasing Lin's keen understanding of material science in technology applications.
Career Highlights: Andrew Lin is associated with United Silicon Incorporated, a company that focuses on advanced semiconductor materials and processes. His role within the company underscores his commitment to innovation and the evolution of semiconductor technology. Throughout his career, Lin's work has placed him at the forefront of research and development in the industry.
Collaborations: Throughout his career, Lin has collaborated with notable colleagues, including Shih-Ming Lan and Chun-Liang Liu. These partnerships have contributed to the success of various projects, allowing for the exchange of ideas and expertise that drive innovations in insulating technologies.
Conclusion: Andrew Lin exemplifies the spirit of innovation in the semiconductor industry. His patent on the method for forming an insulating film not only resolves a prevalent challenge in the field but also highlights his contributions as a pivotal inventor. With his ongoing dedication to research and collaboration, Lin is poised to make further advancements in the realm of semiconductor technology in the years to come.