Company Filing History:
Years Active: 1993-1995
Title: **Innovative Contributions of Andrew J. Muray in Lithography Technology**
Introduction
Andrew J. Muray, a distinguished inventor based in Fremont, California, has made significant strides in the field of lithography technology. With a portfolio of two patents, Muray's innovations focus on enhancing the precision and efficiency of raster scan lithography systems. His inventive work is pivotal for advancements in very large scale integrated circuit fabrication.
Latest Patents
Muray's latest patents showcase his ingenuity in modifying existing technologies. One of his notable inventions, "Dose modulation and pixel deflection for raster scan lithography," introduces a refined approach to illuminating specific pixels during the scanning process. This method allows pixel intensities to be varied, facilitating more accurate edge placements without requiring multiple passes. The technique employs various levels of illumination (100%, 70%, and 30%) to effectively position edges off the standard Cartesian raster scan grid, optimizing the use of electrostatic deflectors in the beam lens.
Another significant patent, "Discrete phase shift mask writing," presents a novel method for photolithographically creating features on integrated circuit wafers. This invention addresses the limitations associated with intensity nulls at the junctions of phase-shifted regions of a mask. By utilizing a transition region with three phases assigned to pixels, Muray has effectively minimized intensity variations, thus enhancing optical resolution and depth of focus during the fabrication process.
Career Highlights
Andrew J. Muray is currently affiliated with Etec Systems, Inc., where he continues to be at the forefront of innovative lithography solutions. His work not only demonstrates a commitment to technological advancement but also illustrates the important role of patents in protecting and promoting inventive ideas within the tech industry.
Collaborations
Throughout his career, Muray has collaborated with esteemed colleagues, including Frank E. Abboud and C. Neil Berglund. These partnerships have enriched his projects, contributing to enhanced innovation and the successful launch of new technologies in lithography.
Conclusion
Andrew J. Muray stands out as a pioneering inventor whose contributions to raster scan lithography are setting new standards in the field. With his innovative patents focusing on dose modulation and advanced mask writing techniques, he is helping to shape the future of integrated circuit fabrication. His work at Etec Systems, Inc. underscores the importance of collaboration and innovation in driving technological advancements in a competitive landscape.