Company Filing History:
2 out of 613 
1 out of 1,484 Years Active: 1989-2009
Title: The Innovative Contributions of Andrew A. Sobek
Introduction
Andrew A. Sobek is a notable inventor based in Fairlawn, OH (US). He has made significant contributions to the field of polymeric compositions, particularly in the development of photoresist materials used in integrated circuit manufacturing. With a total of 3 patents to his name, Sobek's work has had a lasting impact on the industry.
Latest Patents
One of Sobek's latest patents focuses on polycyclic polymers and their applications as photoresists. The invention details methods for producing these polymers and their use in integrated circuits. Specifically, it describes photoresist compositions formed from the polymerization of halogenated and hydrohalogenated polycyclic monomers. Additionally, the patent outlines methods for post-treating these compositions to reduce optical density and residual materials. The invention also includes catalyst systems that allow for molecular weight control of the photoresist products.
Career Highlights
Throughout his career, Andrew A. Sobek has worked with prominent companies such as Sumitomo Bakelite Company Limited and The B. F. Goodrich Company. His experience in these organizations has contributed to his expertise in polymer science and innovation.
Collaborations
Sobek has collaborated with notable individuals in his field, including Larry Funderburk Rhodes and Richard Vicari. These partnerships have likely enhanced his research and development efforts.
Conclusion
Andrew A. Sobek's contributions to the field of polymeric compositions and photoresist technology demonstrate his innovative spirit and dedication to advancing the industry. His patents reflect a commitment to improving manufacturing processes in integrated circuits.