The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2009
Filed:
Sep. 07, 2005
Larry F. Rhodes, Silver Lake, OH (US);
Richard Vicari, Pasadena, TX (US);
Leah J. Langsdorf, Akron, OH (US);
Andrew A. Sobek, Fairlawn, OH (US);
Edwin P. Boyd, Clinton, OH (US);
Brian Bennett, Brecksville, OH (US);
Larry F. Rhodes, Silver Lake, OH (US);
Richard Vicari, Pasadena, TX (US);
Leah J. Langsdorf, Akron, OH (US);
Andrew A. Sobek, Fairlawn, OH (US);
Edwin P. Boyd, Clinton, OH (US);
Brian Bennett, Brecksville, OH (US);
Sumitomo Bakelite Co., Ltd., Shinagawa-Ku, Tokyo, JP;
Abstract
The present invention relates to polycyclic polymers, methods for producing polycyclic polymers, and methods for their use as photoresists in the manufacture of integrated circuits. In one embodiment, the present invention relates to photoresist compositions formed from the polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer. In another embodiment, the present invention relates to photoresist compositions formed from the co-polymerization of at least one halogenated polycyclic monomer or hydrohalogenated polycyclic monomer with at least one non-halogenated polycyclic monomer.