Mettmann, Germany

Andreas Wende


 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Andreas Wende

Introduction

Andreas Wende is an inventor based in Mettmann, Germany, known for his contributions to materials science and engineering. With a focus on the intricate relationship between stress and strain, Wende has developed a method and computer system that has the potential to impact various applications in engineering and manufacturing.

Latest Patents

Wende holds a patent for a novel method and computer system designed to establish a relationship between stress (σ) and strain (ε). His patent details a comprehensive approach where the relationship is first established through short-term tests as a function of temperature (T). Subsequently, a Findley model is adapted to obtain a correlation between strain and stress as a function of time (t) and temperature (T). The integration of these models results in a robust relationship, enhancing our understanding of material behavior over time and varying conditions.

Career Highlights

Currently, Wende is employed at Bayer Aktiengesellschaft, where he leverages his expertise to advance the company's innovation initiatives. His work focuses on enhancing material performance and reliability through innovative testing and modeling techniques.

Collaborations

Throughout his career, Wende has collaborated with notable professionals in his field, including Bahman Sarabi and Martin Wanders. These partnerships have enriched his research and development projects, fostering a collaborative environment that promotes innovation and practical applications of his findings.

Conclusion

Andreas Wende exemplifies the spirit of innovation in the realm of materials science. With his patent and ongoing work at Bayer Aktiengesellschaft, he is set to make significant contributions to engineering practices, showcasing the importance of establishing foundational relationships in material behavior for future advancements.

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