Wuppertal, Germany

Andreas Runkel

This inventor holds 1 USPTO granted patent. Top assignee: Herberts Gmbh. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andreas Runkel. Retrieved from https://idiyas.com/inventor/andreas-runkel-x9gjtrtd

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: The Innovations of Andreas Runkel

Introduction

Andreas Runkel is a notable inventor based in Wuppertal, Germany. He has made significant contributions to the field of coatings, particularly through his innovative processes. With a focus on multi-layer lacquer coatings, Runkel's work has implications for various industries.

Latest Patents

Runkel holds 1 patent for a "Process for the production of multi-layer lacquer coatings." This patent showcases his expertise in developing advanced coating techniques that enhance the durability and aesthetic appeal of surfaces.

Career Highlights

Andreas Runkel is currently employed at Herberts GmbH, a company known for its expertise in coatings and surface technologies. His role at the company allows him to apply his innovative ideas in a practical setting, contributing to the advancement of coating technologies.

Collaborations

Throughout his career, Runkel has collaborated with talented individuals such as Frank Lieverz and Volker Ducoffre. These partnerships have fostered a creative environment that encourages the development of new ideas and solutions in the coatings industry.

Conclusion

Andreas Runkel's contributions to the field of multi-layer lacquer coatings highlight his innovative spirit and dedication to advancing technology. His work at Herberts GmbH and his collaborations with other professionals further emphasize the impact of his inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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