This inventor holds 2 USPTO granted patents. Top assignee: Infineon Technologies Ag. Active years: 2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2006
Title: Innovations by Andreas Purath in Polishing Pad Technology
Introduction
Andreas Purath is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of polishing pad technology, holding 2 patents that enhance the efficiency and effectiveness of chemical mechanical polishing processes.
Latest Patents
His latest patents include a "Method and configuration for conditioning a polishing pad surface." This invention describes a method that measures the rotation table current or voltage as an input for a motor driving the rotation of the polishing pad versus a rotating conditioning head. The method utilizes electrical power input as a measure of actual abrasion effective in regenerating the polishing pad. It issues a warning signal when the electrical power input exceeds a limit, prompting actions to maintain the uniformity of the conditioning process. The polishing pad can be conditioned by adjusting the rotation speed or the conditioning head pressure in response to the warning signal.
Another significant patent is the "Arrangement and method for conditioning a polishing pad." This invention enables in-situ measurement of thickness profiles of polishing pads used in chemical mechanical polishing. It involves arranging sensors for measuring distances alongside a conditioner. The sensors can perform indirect or direct measurements of the pad's thickness, allowing for the detection of disadvantageous thickness profiles that could lead to polishing inhomogeneities. This innovation prolongs the pad's lifetime and increases the yield of semiconductor devices.
Career Highlights
Andreas Purath works at Infineon Technologies AG, where he applies his expertise in polishing pad technology. His work has been instrumental in advancing the methods used in semiconductor manufacturing.
Collaborations
He collaborates with notable coworkers, including Walter Glashauser and Benno Utess, contributing to the development of innovative solutions in their field.
Conclusion
Andreas Purath's contributions to polishing pad technology through his patents demonstrate his commitment to innovation and improvement in semiconductor manufacturing processes. His work continues to influence the industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile