Friedberg, Germany

Andreas Johannes Jendrzey

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andreas Johannes Jendrzey. Retrieved from https://idiyas.com/inventor/andreas-johannes-jendrzey

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Andreas Johannes Jendrzey: Inventor of a Pressure-Based Mass Flow Verification Method.

Introduction

Andreas Johannes Jendrzey is an inventor based in Friedberg, Germany. His patent work includes a method for verifying mass flow by measuring the rate at which pressure rises in a chamber.

Latest Patents

Jendrzey is associated with one patent, titled “Variably Choked Pressure Rate-of-Rise Mass Flow Verifier.” The method directs gas through a variable orifice, a chamber, and an outlet isolation valve. It establishes a choked pressure regime by maintaining the pressure upstream of the orifice at least twice the pressure downstream. After the outlet valve closes and gas fills the chamber, the method measures the chamber’s pressure rate-of-rise and uses that measurement to determine one or more flow measurements.

Career Highlights

Jendrzey is associated with Applied Materials, Inc. His patent describes an approach to mass flow verification that uses pressure behavior within a chamber as the basis for flow measurements.

Collaborations

Jendrzey’s listed coworker is Ming Xu. Their association reflects a professional connection in the context of the available inventor and patent information.

Conclusion

Andreas Johannes Jendrzey’s patent presents a pressure-based method for verifying gas flow, combining a variable orifice, a choked pressure regime, and pressure rate-of-rise measurements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…