Andreas Jahnke

Title: The Innovations of Andreas Jahnke

Introduction

Andreas Jahnke is a notable inventor based in Radebeul, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving processes in lithography and integrated circuit fabrication.

Latest Patents

One of his latest patents is a "Mask with registration marks and method of fabricating integrated circuits." This innovation involves a photomask for a lithography apparatus that includes a chip pattern designed to be transferred into a resist layer on a workpiece. It features at least one registration mark that is not transferred into the resist layer, thereby enhancing mask qualification without affecting wafer-level processes.

Another significant patent is titled "Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration." This invention describes a method where a semiconductor wafer is exposed with a pattern from a mask or reticle in an exposure tool. The exposure tool is equipped with an adjustable lens system and a tunable light source. The process involves performing a first exposure with a tuned wavelength and then adjusting the lens system for a second exposure to correct for chromatic aberration.

Career Highlights

Andreas has worked with prominent companies in the semiconductor industry, including Infineon Technologies AG and Qimonda AG. His experience in these organizations has contributed to his expertise in the field.

Collaborations

Throughout his career, Andreas has collaborated with notable colleagues such as Christoph Nölscher and Ralf Ziebold. These partnerships have likely enriched his work and led to further innovations.

Conclusion

Andreas Jahnke's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the field of integrated circuits and lithography.