This inventor holds 2 USPTO granted patents. Top assignee: Basf Lacke+farben Ag. Active years: 1997.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1997
Title: Innovations of Andreas Holst in Polymer Chemistry
Introduction
Andreas Holst is a notable inventor based in Neu Wulmstorf, Germany. He has made significant contributions to the field of polymer chemistry, particularly in the development of advanced coating agents. With a total of 2 patents to his name, Holst's work has implications for various industrial applications.
Latest Patents
Holst's latest patents include the "Carboxyl-containing acrylate copolymer" and "epoxy resin - Carboxyl-containing acrylate copolymer." These innovations focus on a coating agent that comprises a binding agent containing at least one acrylate copolymer with carboxyl groups and/or at least one acrylate copolymer with epoxide groups. The copolymers are obtained through solution polymerization, utilizing less than 5% by weight of one or more polysiloxane macromonomers, along with addition and/or condensation resins with carboxyl groups and epoxy resins.
Career Highlights
Andreas Holst is currently employed at BASF Lacke + Farben AG, a leading company in the chemical industry. His work at BASF has allowed him to focus on innovative solutions in polymer applications, contributing to the company's reputation for excellence in coatings and materials.
Collaborations
Holst has collaborated with esteemed colleagues such as Stephan Engelke and Michael Brunnemann. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Andreas Holst's contributions to polymer chemistry through his patents and collaborations highlight his role as an influential inventor in the field. His work continues to impact the industry, paving the way for future innovations in coating technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
