Ingelheim, Germany

Andreas Hirsch

This inventor holds 1 USPTO granted patent. Top assignee: Schott Ag. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andreas Hirsch. Retrieved from https://idiyas.com/inventor/andreas-hirsch-gewj2g8l

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: The Innovations of Andreas Hirsch

Introduction

Andreas Hirsch is a notable inventor based in Ingelheim, Germany. He has made significant contributions to the field of material science, particularly in the area of hot forming techniques. His work has implications for various industries that utilize transparent and semitransparent materials.

Latest Patents

Hirsch holds a patent for "Hot formed articles and method and apparatus for hot-forming." This innovative method involves semi-homogeneously heating at least a part of an article by radiation and subsequently forming the heated part of the article. This technique enhances the efficiency and quality of the hot forming process.

Career Highlights

Andreas Hirsch is associated with Schott AG, a leading company in the field of specialty glass and glass-ceramics. His role at Schott AG has allowed him to explore and develop advanced manufacturing techniques that push the boundaries of material applications.

Collaborations

Hirsch has worked alongside esteemed colleagues such as Bernd Hoppe and Ulrich Fotheringham. Their collaborative efforts have contributed to the advancement of innovative solutions in material processing.

Conclusion

Andreas Hirsch's contributions to the field of hot forming and material science exemplify the spirit of innovation. His patent and work at Schott AG highlight the importance of advancing manufacturing techniques for transparent and semitransparent materials.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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