Andreas Amrein

Title: The Innovative Contributions of Andreas Amrein

Introduction

Andreas Amrein is a notable inventor based in Zurich, Switzerland. He has made significant contributions to the field of photolithography through his innovative patent. His work focuses on methods that enhance the precision and efficiency of printing periodic patterns.

Latest Patents

Andreas Amrein holds a patent titled "Method and apparatus for printing a periodic pattern with a varying duty cycle." This patent describes a method for forming a surface-relief grating with a desired spatial variation of duty cycle in a layer of photoresist. The process involves providing a first mask with a high-resolution grating, arranging it at a specific distance from a substrate, and using a second mask with a variable-transmission grating. The innovative approach allows for precise control over the energy density distribution that exposes the photoresist, leading to improved results in lithography.

Career Highlights

Amrein is associated with Eulitha AG, a company that specializes in advanced lithography solutions. His work at Eulitha AG has positioned him as a key player in the development of cutting-edge technologies in the field. His expertise in photolithography has contributed to the company's reputation for innovation and excellence.

Collaborations

Andreas Amrein has collaborated with notable colleagues such as Francis Clube and Maxime Lebugle. These collaborations have fostered an environment of creativity and innovation, leading to advancements in their respective fields.

Conclusion

Andreas Amrein's contributions to the field of photolithography through his innovative patent and work at Eulitha AG highlight his role as a significant inventor. His dedication to advancing technology continues to impact the industry positively.