Anatloy Fabrikant

Title: Innovations by Anatloy Fabrikant

Introduction

Anatloy Fabrikant is a notable inventor based in Fremont, CA. He has made significant contributions to the field of scatterometric measurements, showcasing his expertise through his innovative patent.

Latest Patents

Anatloy Fabrikant holds a patent for a "System for scatterometric measurements and applications." This invention employs regression and optimized estimation methods to determine critical dimensions and other parameters in scatterometry. Instead of relying on a full multi-dimensional look-up-table, his approach starts from a 'best guess' value of the parameter. The model utilizes precalculated eigenvalues that can be stored and reused for structures with common characteristics, thereby saving time. The method also limits scatterometric data to wavelengths that are less sensitive to underlying film characteristics. Furthermore, it constructs a three-dimensional grating model by slicing a representative structure into slabs and approximating each slab with rectangular blocks. This innovative model aids in finding parameters of diffracting structures in scatterometry.

Career Highlights

Anatloy Fabrikant is associated with Kla-Tencor Technologies Corporation, where he applies his expertise in developing advanced measurement systems. His work has been instrumental in enhancing the accuracy and efficiency of scatterometric measurements.

Collaborations

Anatloy has collaborated with notable colleagues, including Guoheng Zhao and Daniel C. Wack, contributing to the advancement of technology in his field.

Conclusion

Anatloy Fabrikant's innovative work in scatterometric measurements exemplifies the impact of his inventions on the industry. His contributions continue to influence advancements in measurement technologies.