Kyiv, Ukraine

Anastasiia Cherneha

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anastasiia Cherneha. Retrieved from https://idiyas.com/inventor/anastasiia-cherneha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Anastasiia Cherneha: Innovator in Document Style Adjustment Technology

Introduction

Anastasiia Cherneha is a talented inventor based in Kyiv, Ukraine. She has made significant contributions to the field of document processing technology. Her innovative approach focuses on enhancing user experience through effective document style adjustments.

Latest Patents

Anastasiia holds a patent for a method, electronic device, and storage medium for adjusting document style. This patent outlines a process that includes obtaining a target document from a user and a style reference document. The method involves extracting document style information from the style reference document, adjusting the target document's style based on this information, and displaying the adjusted document. This invention aims to streamline the document styling process, making it more user-friendly.

Career Highlights

Anastasiia is currently employed at Samsung Electronics Ltd., where she continues to develop her innovative ideas. Her work at such a prestigious company highlights her expertise and commitment to advancing technology in document processing.

Collaborations

Anastasiia collaborates with talented coworkers, including Dmytro Zhelezniakov and Nataliya Sakhnenko. These partnerships foster a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Anastasiia Cherneha is a remarkable inventor whose work in document style adjustment technology is paving the way for more efficient document processing solutions. Her contributions are valuable to the field and demonstrate her dedication to innovation.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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