This inventor holds 1 USPTO granted patent. Top assignee: National Semiconductor Corporation. Active years: 1995.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1995
Title: The Innovations of Anand J Bariya
Introduction
Anand J Bariya is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of photolithography through his innovative patent. His work is particularly recognized for its application in advanced semiconductor technologies.
Latest Patents
Anand J Bariya holds a patent for a Plasma Polymer Antireflective Coating. This antireflective coating is utilized in the photolithography process, where it is applied and removed in a plasma reactor. The halocarbon plasma polymer, specifically the fluorocarbon plasma polymer, provides an improved antireflective coating, enhancing the efficiency and effectiveness of the photolithography process.
Career Highlights
Anand J Bariya is associated with National Semiconductor Corporation, where he has contributed to various projects and innovations. His expertise in plasma polymer technology has positioned him as a valuable asset in the semiconductor industry.
Collaborations
Some of his notable coworkers include Kevin Carl Brown and Satyendra S Sethi. Their collaborative efforts have further advanced the research and development in their respective fields.
Conclusion
Anand J Bariya's contributions to the field of photolithography through his innovative patent demonstrate his commitment to advancing technology in the semiconductor industry. His work continues to influence the development of more efficient manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile