Pickerington, OH, United States of America

Amit Das

This inventor holds 1 USPTO granted patent. Top assignee: The Mead Corporation. Active years: 2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Amit Das. Retrieved from https://idiyas.com/inventor/amit-das-smq1ys3w

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Amit Das

Introduction

Amit Das is a notable inventor based in Pickerington, Ohio. He has made significant contributions to the field of materials science, particularly in the development of wear-resistant papers. His innovative approach has led to advancements that benefit various industries, especially in decorative laminates.

Latest Patents

Amit Das holds a patent for a "Process for manufacturing wear resistant paper." This invention focuses on creating abrasion-resistant papers, such as overlays or decor sheets, which are particularly useful in decorative laminates. The patent addresses the incorporation of spacer or separator particles to minimize damage to highly polished caul plates during the lamination process. This innovation enhances the durability and functionality of materials used in various applications.

Career Highlights

Amit Das is associated with The Mead Corporation, where he applies his expertise in materials science. His work at the company has allowed him to explore and develop new technologies that improve product quality and performance. His dedication to innovation has positioned him as a valuable asset in the field.

Collaborations

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Conclusion

Amit Das exemplifies the spirit of innovation through his contributions to the development of wear-resistant papers. His work not only enhances product durability but also showcases the importance of research and development in advancing material technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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