Kfar Mordechai, Israel

Amir Noy

USPTO Granted Patents = 2 

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Amir Noy: A Pioneer in Dynamic Pattern Transfer Technologies

Introduction

Amir Noy, an innovative inventor residing in Kfar Mordechai, Israel, has made significant contributions to the field of pattern transfer technology. With two patents to his name, Amir's work focuses on advancing printing systems that enhance the efficiency of pattern transfers in various applications, including photovoltaic cells.

Latest Patents

Amir's latest patents include groundbreaking technologies in dynamic pattern transfer printing. His work on "Dynamic Pattern Transfer Printing" describes a system that effectively decouples the design of trench patterns from the resulting metallic paste patterns transferred onto receiving substrates. By manipulating the movement of the receiving substrate, this innovation allows for more effective pattern transfers, accommodating different substrate widths and achieving high wafer throughput. Another patent relates to "Pattern Transfer Sheets with Separate Multiple Groups of Trenches," which provides monitoring systems for laser illumination during paste pattern transfers, enhancing precision and reducing misalignment risks.

Career Highlights

Throughout his career, Amir has worked with notable companies, including Wuhan Dr Laser Technology Corporation, where he developed essential technologies that support modern manufacturing processes. His unwavering commitment to innovation has positioned him as a prominent figure in his field.

Collaborations

Working alongside talented individuals such as Benny Naveh and Eyal Cohen, Amir has cultivated collaborative environments that encourage the exchange of ideas and foster technological advancements. These partnerships have played a crucial role in the development of his patented technologies.

Conclusion

Amir Noy stands out as a remarkable inventor whose work has the potential to reshape the landscape of pattern transfer technologies. His dedication to innovation and collaboration continues to drive advancements that benefit multiple industries, particularly in solar energy and electronic circuitry.

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