This inventor holds 1 USPTO granted patent. Top assignee: Smoltek Ab. Active years: 2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015
Title: Innovations of Amin Saleem Muhammad
Introduction
Amin Saleem Muhammad is a notable inventor based in Gothenburg, Sweden. He has made significant contributions to the field of lithography through his innovative patent. His work focuses on creating high aspect ratio templates that are essential for nanoscale applications.
Latest Patents
Amin holds a patent titled "Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale." This invention involves a template and method for creating high aspect ratio templates, stamps, and imprinting at the nanoscale using nanostructures. The primary purpose of this technology is to facilitate lithography and enable the creation of perforations on various materials and products.
Career Highlights
Amin Saleem Muhammad is currently associated with Smoltek AB, a company that specializes in advanced nanotechnology solutions. His work at Smoltek AB has allowed him to push the boundaries of what is possible in the field of nanotechnology and lithography.
Collaborations
Amin has collaborated with notable colleagues, including David Brud and Jonas Berg. Their combined expertise has contributed to the advancement of innovative technologies in their respective fields.
Conclusion
Amin Saleem Muhammad's contributions to the field of lithography and nanotechnology are noteworthy. His innovative patent and work at Smoltek AB highlight his commitment to advancing technology at the nanoscale.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile