Hamlin, NY, United States of America

Amgad W Sifain

This inventor holds 1 USPTO granted patent. Top assignee: Xerox Corporation. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Amgad W Sifain. Retrieved from https://idiyas.com/inventor/amgad-w-sifain

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 12.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Amgad W Sifain: Innovator in Toner Processes

Introduction

Amgad W Sifain is a notable inventor based in Hamlin, NY (US). He has made significant contributions to the field of toner processes, particularly through his innovative approaches that enhance efficiency in production.

Latest Patents

Amgad holds a patent for toner particles generated by emulsion/aggregation processes. This patent, which is focused on toner processes, discloses methods that shorten the time for coalescence and post-formation washing. As a result, these processes increase efficiency compared to conventional methods.

Career Highlights

Amgad W Sifain is associated with Xerox Corporation, a leading company in the field of imaging and printing technology. His work at Xerox has allowed him to develop and refine his innovative ideas, contributing to advancements in toner technology.

Collaborations

Amgad has collaborated with talented coworkers, including Emily Louise Moore and Anthony Uttaro, Jr. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.

Conclusion

Amgad W Sifain's contributions to toner processes exemplify the impact of innovation in the printing industry. His work continues to influence the efficiency of toner production, showcasing the importance of inventive thinking in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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