Mountain View, CA, United States of America

Ameeta B Madhava

This inventor holds 1 USPTO granted patent. Top assignee: Lexmark International, Inc.. Active years: 2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ameeta B Madhava. Retrieved from https://idiyas.com/inventor/ameeta-b-madhava

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Ameeta B Madhava

Introduction

Ameeta B Madhava is a notable inventor based in Mountain View, CA. She has made significant contributions to the field of ink compositions, particularly with her innovative patent that enhances the performance of inks. Her work is recognized for its potential applications in various printing technologies.

Latest Patents

Ameeta holds a patent for "Wet rub resistant ink compositions." This composition comprises, by weight, at least about 15% carrier medium, colorant in an amount of no more than about 20%, and at least about 2% polymeric capsules having central cavities containing water. The composition is substantially free of film-forming resins. This ink composition can be used in combination with other ink compositions having different colors or shades to increase the color gamut of an ink system.

Career Highlights

Ameeta is currently employed at Lexmark International, Inc., where she continues to develop innovative solutions in the field of ink technology. Her work has contributed to advancements in printing quality and durability.

Collaborations

Ameeta collaborates with talented individuals such as Bradley Leonard Beach and Anna Marie Pearson, who contribute to her projects and enhance the innovative environment at Lexmark.

Conclusion

Ameeta B Madhava's contributions to ink technology through her patent demonstrate her commitment to innovation and excellence in her field. Her work continues to influence the industry and improve printing technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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