Company Filing History:
Years Active: 1999-2017
Title: Ambar K Mitra: Innovator in Focused Electric-Field Imprinting
Introduction
Ambar K Mitra is a notable inventor based in Ames, Iowa, recognized for his contributions to the field of focused electric-field imprinting. With a total of seven patents to his name, Mitra has made significant advancements in the creation of micron and sub-micron patterns on various surfaces. His innovative techniques have the potential to revolutionize manufacturing processes in electronics and materials science.
Latest Patents
Mitra's latest patents include a method for focused electric-field imprinting for micron and sub-micron patterns on wavy or planar surfaces. This process, known as Focused Electric Field Imprinting (FEFI), utilizes a focused electric field to guide both unplating and plating operations, enabling the formation of very fine-pitched metal patterns on substrates. The FEFI process allows for the imprinting of patterns ranging from 2000 microns to 20 microns in width, and depths from about 0.1 microns to over 10 microns. The technology is capable of generating sub-100-nm features through a parallelized feature-generation process, which can produce sub-100-nm lines with corresponding spacing. The FEFI process has been successfully implemented on copper substrates and is effective on other conductive materials as well.
Career Highlights
Throughout his career, Ambar K Mitra has worked with various organizations, including Actus Potentia, Inc. and the Iowa State University Research Foundation, Inc. His work has been instrumental in advancing the understanding and application of electric-field imprinting technologies.
Collaborations
Mitra has collaborated with several professionals in his field, including Abhijit Chandra and Ashraf F Bastawros. These collaborations have contributed to the development and refinement of his innovative techniques.
Conclusion
Ambar K Mitra's work in focused electric-field imprinting represents a significant advancement in the field of materials science and manufacturing. His patents and collaborations highlight his commitment to innovation and excellence in technology.
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